Low-toxicity chemical solution deposition of ferroelectric Ca:HfO<sub>2</sub>

نویسندگان

چکیده

Simple, stable, and low-toxicity chemical solution for deposition of ferroelectric Ca:HfO 2 films.

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ژورنال

عنوان ژورنال: Journal of Materials Chemistry C

سال: 2023

ISSN: ['2050-7526', '2050-7534']

DOI: https://doi.org/10.1039/d2tc04182k